| PAT. NO. | Title |
| 1 | 10,991,592 | Modified
etch-and-deposit Bosch process in silicon |
| 2 | 10,730,239 | 3D
printing apparatus using a beam of an atmospheric pressure inductively
coupled plasma generator |
| 3 | 10,475,628 | Plasma
beam penetration of millimeter scale holes with high aspect ratios |
| 4 | 9,484,190 | Showerhead-cooler
system of a semiconductor-processing chamber for semiconductor wafers of
large area |
| 5 | 9,275,840 | Method
for providing uniform distribution of plasma density in a plasma treatment
apparatus |
| 6 | 9,273,393 | Torch
system for depositing protective coatings on interior walls and recesses
present on the flat surface of an object |
| 7 | 8,062,470 | Method
and apparatus for application of thin coatings from plasma onto inner
surfaces of hollow containers |
| 8 | 7,967,945 | RF
antenna assembly for treatment of inner surfaces of tubes with inductively
coupled plasma |
| 9 | 7,148,472 | Aerosol
mass spectrometer for operation in a high-duty mode and method of
mass-spectrometry |
| 10 | 7,071,466 | Mass
spectrometry system for continuous control of environment |
| 11 | 6,974,957 | Ionization
device for aerosol mass spectrometer and method of ionization |
| 12 | 6,803,585 | Electron-cyclotron
resonance type ion beam source for ion implanter |
| 13 | 6,791,079 | Mass
spectrometer based on the use of quadrupole lenses with angular gradient of
the electrostatic field |
| 14 | 6,783,629 | Plasma
treatment apparatus with improved uniformity of treatment and method for
improving uniformity of plasma treatment |